Serveur d'exploration sur le cobalt au Maghreb

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Growth and properties of electrodeposited cobalt films on Pt/Si(1 0 0) surface

Identifieur interne : 000A06 ( Main/Exploration ); précédent : 000A05; suivant : 000A07

Growth and properties of electrodeposited cobalt films on Pt/Si(1 0 0) surface

Auteurs : A. Azizi [Algérie] ; A. Sahari [Algérie] ; M. L. Felloussia [Algérie] ; G. Schmerber [France] ; C. Meny [France] ; A. Dinia [France]

Source :

RBID : Pascal:05-0035950

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English descriptors

Abstract

In this paper, the growth, structural and magnetic properties of cobalt (Co) films electrodeposited on a Pt/Si(1 0 0) substrate have been investigated. Co films with metallic appearance were obtained from aqueous solution of 0.1 M CoSO4, 10 mM CoCl2 as the source of metal ions and I M Na2SO4 as a supporting electrolyte with 0.5 M H3BO3 at pH 4.2. This electrochemical technique indicated a deposition peak signature of limited diffusion growth with the transition from progressive to instantaneous nucleation mechanism. The atomic force microscopy (AFM) images showed a granular structure of the electrodeposited layers. X-ray measurements (XRD) and nuclear magnetic resonance (NMR) indicate a small grain size with the presence of a mixture of Co hcp and fcc structures. The magnetic properties of the deposited films were investigated with a magnetic field in the parallel and perpendicular direction and showed that the easy magnetization axis is in the plane.


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<term>Aqueous solutions</term>
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<term>Cobalt</term>
<term>Diffusion</term>
<term>Electrodeposition</term>
<term>FCC lattices</term>
<term>Film growth</term>
<term>Grain size</term>
<term>Granular structure</term>
<term>HCP lattices</term>
<term>Ion sources</term>
<term>Magnetic field effects</term>
<term>Magnetization</term>
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<term>Solution aqueuse</term>
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<term>pH</term>
<term>Diffusion(transport)</term>
<term>Nucléation</term>
<term>Microscopie force atomique</term>
<term>Structure granulaire</term>
<term>Diffraction RX</term>
<term>Résonance magnétique nucléaire</term>
<term>Grosseur grain</term>
<term>Réseau hexagonal compact</term>
<term>Réseau cubique face centrée</term>
<term>Effet champ magnétique</term>
<term>Aimantation</term>
<term>Cobalt</term>
<term>Silicium</term>
<term>Croissance film</term>
<term>Dépôt électrolytique</term>
<term>Co</term>
<term>Si</term>
<term>Métal transition</term>
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<div type="abstract" xml:lang="en">In this paper, the growth, structural and magnetic properties of cobalt (Co) films electrodeposited on a Pt/Si(1 0 0) substrate have been investigated. Co films with metallic appearance were obtained from aqueous solution of 0.1 M CoSO
<sub>4</sub>
, 10 mM CoCl
<sub>2</sub>
as the source of metal ions and I M Na
<sub>2</sub>
SO
<sub>4</sub>
as a supporting electrolyte with 0.5 M H
<sub>3</sub>
BO
<sub>3</sub>
at pH 4.2. This electrochemical technique indicated a deposition peak signature of limited diffusion growth with the transition from progressive to instantaneous nucleation mechanism. The atomic force microscopy (AFM) images showed a granular structure of the electrodeposited layers. X-ray measurements (XRD) and nuclear magnetic resonance (NMR) indicate a small grain size with the presence of a mixture of Co hcp and fcc structures. The magnetic properties of the deposited films were investigated with a magnetic field in the parallel and perpendicular direction and showed that the easy magnetization axis is in the plane.</div>
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